About PlasmaCCP
What PlasmaCCP is
PlasmaCCP is a fast trend simulator for RF CCP chambers, built for process engineers and plasma researchers.
Who it is for
It's for the early stage of chamber and process work — when you have more options than chamber time, and want to narrow them down before paying for experiments or a high-fidelity study.
What it does and does not claim
It screens trends: how geometry, gas mix, pressure, power and bias move the outputs. It is not a replacement for experiment, chamber metrology, or a high-fidelity commercial code — nothing here is meant for absolute sign-off, and the validation page spells out exactly how far the model has been checked.